I would like to inquire about UV blocker. In Ember resins you use Mayzo OB+ (2,2’-(2,5-thiophenediyl)bis(5-tert-butylbenzoxazole)) 0.160 %. If I understand correct it prevents UV light to be absorbed deep in the resin. That is why we can have certain height layers. Another important thing is that free radical polymerization occurs in Ember resins.
My question is if the same UV blocker is compatible with cationic polymerization systems?
I and a team are developing new resin, which is based on free radical promoted cationic polymerization. I was trying to do Working Curve Measurement with it. But the drawback is that the whole layer cast on PDMS window polymerizes at once after it gets UV light. And I can’t get varying height squares. All the sample is flat and the same thickness. What I’ve noticed more, the reactions continues after exposition is turned off till there is uncured resin.
Would UV blocker help to control layer height in cationic resins?
Any suggestions are welcome!